PTmasker − Compute stitching masks
PTmasker [options] tiff_file(s)
PTmasker computes stitching masks. It implements the ability to increase depth-of-field by stacking images.
−p prefix
Prefix for output files (defaults to masked%4d).
−e feather
Size of the feather (defaults to zero).
−f |
Force processing (do not stop on warnings). |
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−x |
Delete source files (use with care). |
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−q |
Quiet run. |
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−h |
Output help summary. |
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−z |
Enable Extended depth of field. |
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−m |
Focus estimation mask type. |
0 hard-edged masks, mutually exclusive
1 hard-edged masks, stack of nested masks
2 blended masks, stack of nested masks
2 is default and strongly recommended: This option includes a smoothing computation that seems to help a lot.
−w integer
Focus estimation window size. Only available if −z.
Recommended value is 0.51001114526f image width, e.g. 4 pixels for an 800−pixel image.
Computation cost for focus estimation increases proportional to N^2. Defaults to w4.
−s integer
Smoothing window size. Only available if −z.
Recommended value is 0.50f image width, e.g. 4 pixels for an 800−pixel image.
Computation cost for focus estimation increases proportional to N^2. Defaults to w4.
Panorama Tools was originally created by Professor Helmut Dersch, it’s now maintained by Bruno Postle <bruno AT postle DOT net>.
PTmasker was written by Daniel M German <dmgerman AT uvic DOT ca>.
This manpage was written by Cyril Brulebois <cyril.brulebois@enst−bretagne.fr> and is licensed under the same terms as the libpano13 package itself.